distant areas: Static units are generally situated remotely, increasing Price tag and reducing In general program effectiveness.

thirty% of its peak power use, providing our shoppers sizeable reduction in operating charges and enhanced dependability.

While using the POU3500, you are able to accomplish unparalleled get more info brings about etch functionality, chamber uptime, minimized expense of ownership and fab House utilization – all while improving your approach trustworthiness.

We embrace particular accountability and take accountability for prudent risk taking. We encourage personalized values, which guideline us to continually fulfill the commitments we make and we endeavor to take care of Individuals with whom we connect with regard as we desire to be taken care of ourselves.

This extraordinary system, supplying a small variety factor, low Cost-of-possession and Dynamic Temperature Handle supplied process and machines engineers a completely new Instrument to enhance their temperature delicate processes.

The accuracy with the POU 3300 permits unbiased Charge of the process fluid temperature for the wafer chuck within +/- 0.one °C of set point, as well as the speedy response time of your technique lets for max wafer-to-wafer repeatability throughout the etch method.

The precision from the POU 3500 allows for impartial control of the method fluid temperature on the wafer chuck within just +/- 0.one °C of established stage, as well as the fast response time of your procedure allows for maximum wafer-to-wafer repeatability through the entire etch course of action.

With our unit strategically mounted around 6 toes in the chamber, we accomplish a way more precise looking through on the chuck temperature. This strategy makes certain consistent temperature through the generation lot, bringing about improved wafer-to-wafer CD uniformity.

The data pertains to some 300mm chamber temperature profile through a higher facet ratio Etch method, functioning at incredibly substantial RF power situations (~three.8kW). The persuasive aspects of this details established are:

Dynamic Temperature Command, as implemented in methods similar to the LAUDA-Noah POU, is really an technique that senses the temperature of the method fluid returning from the procedure chamber’s wafer chuck (ESC) and dynamically adjusts the temperature with the equipped method fluid determined by this actual-time feed-back.

the info established here is from a 200mm volume production wafer fab and Evidently illustrates the benefit of the LAUDA-Noah POU program.

More than at any time, shrinking unit geometries, demanding new procedures and a remarkably aggressive natural environment demand temperature control systems that Blend rapidly and exact temperature Management by having an emphasis on decreased functioning charges and improved reliability.

The reality is true Dynamic Temperature Regulate can only be attained when all 5 (five) of the following procedure style and installation prerequisites are satisfied:

observing free movies on the internet is a handy and frugal way to see the movies you love proper through the comfort and ease of your own private property.

We need significantly less cooling/heating potential for the same application for a static TCU due to our modest reservoir volume.